| 摘要 |
PURPOSE: A pellicle film, a manufacturing method of the same, and a pellicle with the same are provided to improve exposure quality and throughput by being used under higher exposure intensity. CONSTITUTION: A pellicle film(15) for a pellicle which is used for a lithography process irradiating ultraviolet rays of a wavelength range between 350nm and 450 nm. The pellicle film includes an ultraviolet ray absorbent layer(22) on at least the surface of a raw pellicle film toward exposure light source. An anti-reflective layer is further arranged on the ultraviolet ray absorbent layer. A binding resin for the ultraviolet ray absorbent layer is a silicon resin. |
