| 摘要 |
The method involves anodically oxidizing an implant for forming a porous oxide layer in an alkaline solution. Metal having infectious characteristics in the oxide layer is galvanically isolated, and the metal-containing oxide layer is cured by irradiation. An electrolyte contains sodium silicate and sodium hydroxide for the anodic oxidation. Copper, silver and/or zinc are incorporated in the oxide layer. The oxide layer is blasted with glass beads and has thickness in the range of 8 to 15 micrometers. |
