REFLECTION TYPE MASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reflection type mask with reduced damage even when thermal load is applied thereto.SOLUTION: The reflection type mask includes: a reflection layer 101 composed of a multilayer film for reflecting extreme-ultraviolet light; a substrate 100 for supporting the reflection layer; and a heat diffusion layer 104 for diffusing heat of the reflection layer, disposed between the reflection layer 101 and the substrate 100. A heat capacity per unit area of a structure constituted of the reflection layer 101 and the heat diffusion layer 104 is equal to or larger than 1.1(J/(K m)).