发明名称 POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.</p>
申请公布号 KR101487866(B1) 申请公布日期 2015.01.29
申请号 KR20120093094 申请日期 2012.08.24
申请人 发明人
分类号 G03F7/20;G03F9/00;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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