发明名称 THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING BACKPLANE FOR FLAT PANEL DISPLAY
摘要 Provided are a thin-film transistor (TFT), a method of manufacturing the same, and a method of manufacturing a backplane for a flat panel display (FPD). The method of manufacturing the TFT according to an embodiment of the present invention includes forming a gate electrode on a substrate; forming an insulating layer on the substrate to cover the gate electrode; performing a plasma treatment on an upper surface of the insulating layer using a halogen gas; forming an oxide semiconductor layer on the insulating layer and positioned to correspond to the gate electrode; and forming source and drain electrodes on the insulating layer to contact and over portions of the oxide semiconductor layer.
申请公布号 US2015028331(A1) 申请公布日期 2015.01.29
申请号 US201414339232 申请日期 2014.07.23
申请人 Samsung Display Co., Ltd. ;University-Industry Cooperation Group of Kyung Hee University 发明人 Seol Young-Gug;KIM Tae-Woong;Jang Jin;Avis Christophe
分类号 H01L29/786;H01L29/66;H01L27/12 主分类号 H01L29/786
代理机构 代理人
主权项 1. A method of manufacturing a thin-film transistor (TFT), the method comprising: forming a gate electrode on a substrate; forming an insulating layer on the substrate to cover the gate electrode; performing a plasma treatment on an upper surface of the insulating layer, the plasma treatment using a halogen gas; forming an oxide semiconductor layer on the insulating layer and positioned to correspond to the gate electrode; and forming source and drain electrodes on the insulating layer and over portions of the oxide semiconductor layer.
地址 Yongin-City KR