发明名称 光触媒親水性の低下を防止する方法
摘要 <p>Disclosed is a method for preventing a photocatalyst from decreasing in hydrophilicity due to contamination by components seeping from a sealing material for anchoring a construction material, exterior material, glass structure, or other article on which a photocatalyst layer is formed. In said method, a transparent sealing-material-component seepage-prevention layer, which contains a modified epoxy resin comprising polymerizable unsaturated monomers graft-polymerized onto or copolymerized with an epoxy resin, is formed on the surface of the sealing material. Said polymerizable unsaturated monomers include a carboxyl-group-containing monomer, and a modified epoxy resin obtained by a carboxyl-group/epoxy-group reaction after graft polymerization or copolymerization is more favorable.</p>
申请公布号 JP5728011(B2) 申请公布日期 2015.06.03
申请号 JP20120525436 申请日期 2011.07.22
申请人 发明人
分类号 E04F13/08;E04B1/66 主分类号 E04F13/08
代理机构 代理人
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