发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: To enable the development of a compsn. with water and to impart water resistance to a produced letterpress printing plate by adding an ethylene- acrylic acid copolymer and an N-contg. compd. capable of neutralizing the acrylic acid component of the copolymer. CONSTITUTION: This compsn. contains an ethylene-acrylic acid copolymer cont. at least about 15wt.%, preferably about 15-25wt.% acrylic acid, an N-contg. compd. capable of neutralizing the acrylic acid component of the copolymer, one or more kinds of mono- or multifunctional ethylenic unsatd. monomers and a photopolymn. initiator. The N-contg. compd. is, e.g. an amine-contg. monomer having anα,β-ethylenic unsatd. bond, preferably dimethylaminopropylmethacryalmide. The ethylenic unsatd. monomers are preferably trimethylolpropane tri(meth)acrylate, etc.
申请公布号 JPH02230152(A) 申请公布日期 1990.09.12
申请号 JP19880149934 申请日期 1988.06.17
申请人 NATSUPU SYST U S A INC 发明人 UIRIAMU AARU WAGUNAA
分类号 G03F7/027;G03F7/033 主分类号 G03F7/027
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