发明名称 半導体製造装置のガス分流供給装置
摘要 <p>A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit 7 works to successively open the respective branched pipe passage opening/closing valves 10a, 10n for a predetermined time and then close the valves, and the gas branched flow supplying apparatus performs flow control of the process gas distributed through the orifice 6 by the pressure type flow control unit 1a, and branches and supplies the process gas by opening and closing the branched pipe passage opening/closing valves 10a, 10n.</p>
申请公布号 JP5754853(B2) 申请公布日期 2015.07.29
申请号 JP20120016266 申请日期 2012.01.30
申请人 发明人
分类号 G05D7/06;G05D11/13 主分类号 G05D7/06
代理机构 代理人
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