| 发明名称 |
ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY |
| 摘要 |
Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency. |
| 申请公布号 |
US2015292877(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201514727038 |
申请日期 |
2015.06.01 |
| 申请人 |
KLA-Tencor Corporation |
发明人 |
Marciano Tal;Amit Eran;Bringoltz Barak;Amir Nuriel;Shaked Amit |
| 分类号 |
G01B11/27;G06F17/50 |
主分类号 |
G01B11/27 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A metrology module configured to estimate inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments, wherein each designed misalignment is between at least two overlapping periodic structures in the respective target cell. |
| 地址 |
Milpitas CA US |
