| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing method capable of efficiently freezing a liquid film covering a top face of a substrate in frozen cleaning and to provide a substrate processing apparatus.SOLUTION: A liquid is provided to a lower face of a substrate before freezing a liquid film covering a top face of the substrate. Then, in parallel to freezing the liquid film, a gas as an evaporation acceleration gas is provided to the lower face of the substrate. Since the lower face of the substrate is wet, when the gas is provided to the lower face of the substrate, the liquid at the lower face of the substrate is evaporated. The frozen liquid film is thawed and removed. Then, the substrate is dried.</p> |
