发明名称 |
Fabrication of optical components using Si, SiGe, SiGeC, and chemical endpoint detection |
摘要 |
One embodiment of the present invention provides a system to facilitate using selective etching to form optical components on a circuit device. The system operates by receiving a substrate composed of a first material including a buffer layer composed of a second material. The system forms a sacrificial layer composed of a third material on the buffer layer. Next, the system forms an optical fiber core composed of a fourth material on the sacrificial layer. After the optical fiber core has been formed, the system performs an etching operation using a selective etchant to remove the sacrificial layer. The system also applies a cladding layer to the optical fiber core.
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申请公布号 |
US2005051514(A1) |
申请公布日期 |
2005.03.10 |
申请号 |
US20040944238 |
申请日期 |
2004.09.16 |
申请人 |
PETERSON JEFFREY J.;HUNT CHARLES E. |
发明人 |
PETERSON JEFFREY J.;HUNT CHARLES E. |
分类号 |
G02B6/12;G02B6/136;(IPC1-7):B29D11/00 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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