发明名称 PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plasma processing device and a plasma processing method capable of reducing damage of a window part.SOLUTION: The plasma processing device comprises: a processing container 2; a pressure reduction part 9 for reducing a pressure inside the processing container; a locating part 4 for locating a workpiece; a gas supply part 18 for supplying gas inside; a window part 3 for permeating electromagnetic waves; a load part 20 arranged outside the window part, and having plural conductor parts 21 and plural capacity parts for generating an electromagnetic field; and a power source 6b for applying power to the load part 20. The conductor parts 21 and the capacity parts are electrically alternately connected to each other. When the workpiece is processed with plasma, a position, at which an imaginary number component of a potential difference becomes 0 (zero), is created at the conductor part 21 provided between the capacity parts, and a value of the imaginary number component of the potential difference between a first terminal and a second terminal of the load part 20 is made not more than a value of an actual number component of the potential difference.
申请公布号 JP2015207562(A) 申请公布日期 2015.11.19
申请号 JP20150119873 申请日期 2015.06.15
申请人 SHIBAURA MECHATRONICS CORP 发明人 IVAN PETROV GANASHEV;KURIYAMA NOBORU;TONO HIDESHI
分类号 H05H1/46;C23C16/507;H01L21/3065 主分类号 H05H1/46
代理机构 代理人
主权项
地址