发明名称 氧化锡(II)之制造方法、氧化锡(II)、镀Sn液之制造方法及镀Sn液之杂质去除方法;METHOD OF MANUFACTURING TIN(II) OXIDE, TIN(II) OXIDE, METHOD OF MANUFACTURING TIN PLATING SOLUTION, AND METHOD OF REMOVING IMPURITIES FROM TIN PLATING SOLUTION
摘要 本发明之氧化锡(II)之制造方法系具备:得到含有Sn离子之酸液的含有Sn离子之酸液形成步骤(S01);对含有Sn离子之酸液添加由碳酸铵、碳酸氢铵、氨水中选出的任1种以上之硷液,保持于pH3~6,而得到Sn沉淀物的第1中和步骤(S02);将Sn沉淀物分离的Sn沉淀物分离步骤(S03);使分离之Sn沉淀物分散于溶媒液的Sn沉淀物分散步骤(S04);及藉由对Sn沉淀物的分散液添加硷液并进行加热而得到SnO的第2中和步骤(S06);在第1中和步骤(S02)中,使Na、K、Pb、Fe、Ni、Cu、Zn、Al、Mg、Ca、Cr、Mn、Co、In、Cd残留于含有Sn离子之酸液中。; the first step of neutralizing the acidic solution containing Sn ions (S02) by adding at least any one alkaline solution selected from the group consisting of ammonium carbonate, ammonium bicarbonate, and aqueous ammonia, to the acid solution to retain pH at 3-6 and to obtain a Sn precipitate; the step of separating the Sn precipitate (S03); the step of dispersing the separated Sn precipitate (S04) in a solvent solution; and the second step of neutralizing the dispersion liquid (S06) by adding an alkaline solution to the dispersion liquid and by heating the dispersion liquid to obtain Tin(II) oxide. After the first step of neutralizing (S02), Na, K, Pb, Fe, Ni, Cu, Zn, Al, Mg, Ca, Cr, Mn, Co, In, Cd are remained in the acidic solution containing Sn ions.
申请公布号 TW201545989 申请公布日期 2015.12.16
申请号 TW104106824 申请日期 2015.03.04
申请人 三菱综合材料股份有限公司 MITSUBISHI MATERIALS CORPORATION 发明人 片濑磨 KATASE, TAKUMA;平野広 HIRANO, HIROTAKA
分类号 C01G19/02(2006.01);C23C18/31(2006.01) 主分类号 C01G19/02(2006.01)
代理机构 代理人 林志刚
主权项
地址 日本 JP