| 发明名称 |
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME |
| 摘要 |
The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. Such a resist composition contains a compound represented by the following general formula (1) or (2): |
| 申请公布号 |
EP2955575(A1) |
申请公布日期 |
2015.12.16 |
| 申请号 |
EP20140748645 |
申请日期 |
2014.01.28 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
ECHIGO, MASATOSHI;YAMAKAWA, MASAKO |
| 分类号 |
G03F7/004;C07C43/20;C07C43/257;C07C69/96;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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