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发明名称
射束照射装置及射束照射方法
摘要
本发明提供一种提高射束照射处理品质之技术。本发明的射束照射装置(10)具备:射束扫描器(26),使带电粒子束(B)沿规定的扫描方向往复扫描;测定器(42),能够测量射入到作为测量对象之区域之带电粒子的角度成份;及资料处理部,利用测定器(42)的测定结果,计算带电粒子束(B)的有效照射发射度。测定器(42)在沿扫描方向往复扫描之带电粒子束(B)通过作为测量对象之区域而射入到测定器(42)之时间内测量针对带电粒子束(B)的角度分布的时间变化值,资料处理部将测定器所测量之角度分布的时间变化值中包含之时间资讯转换为位置资讯来计算有效照射发射度。有效照射发射度表示针对假想射束的发射度,前述假想射束能够藉由将沿扫描方向扫描而射入到作为测量对象之区域之带电粒子束的一部份相加而形成。
申请公布号
TW201546882
申请公布日期
2015.12.16
申请号
TW104118486
申请日期
2015.06.08
申请人
住友重机械离子技术有限公司 SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
发明人
月原光国 TSUKIHARA, MITSUKUNI;井门徳安 IDO, NORIYASU;末次纪之 SUETSUGU, NORIYUKI
分类号
H01L21/265(2006.01)
主分类号
H01L21/265(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本 JP
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