发明名称 Semiconductor device
摘要 A collector layer of a first conductivity type is provided in the IGBT region and the boundary region and functions as a collector of the IGBT in the IGBT region. A cathode layer of a second conductivity type is provided in the diode region apart from the collector layer and functions as a cathode of the diode. A drift layer of the second conductivity type is provided in the IGBT region, the boundary region, and the diode region, the drift layer being provided on sides of the collector layer and the cathode layer opposite the first electrode. A diffusion layer of the first conductivity type is provided in the boundary region on a side of the drift layer opposite the first electrode.
申请公布号 US9214535(B2) 申请公布日期 2015.12.15
申请号 US201314023357 申请日期 2013.09.10
申请人 Kabushiki Kaisha Toshiba 发明人 Matsudai Tomoko;Ogura Tsuneo;Nakamura Kazutoshi;Oshino Yuichi;Ninomiya Hideaki;Ikeda Yoshiko
分类号 H01L29/739;H01L29/36;H01L29/66;H01L29/06 主分类号 H01L29/739
代理机构 White & Case LLP 代理人 White & Case LLP
主权项 1. A semiconductor device, comprising: an first region provided on an electrode; a second region provided on the electrode; a first layer of a first conductivity type in the first region, the first layer being provided on a first surface side of the electrode, a second layer of a second conductivity type in the second region apart from the first layer, the second layer being provided on the first surface side of the electrode; a third layer of the second conductivity type in the first region and the second region, the third layer being provided on sides of the first layer and the second layer opposite the electrode; a fourth layer of the first conductivity type in the first region, the fourth layer being provided on a side of the third layer opposite the electrode; a fifth layer of the first conductivity type provided between the first region and the second region, the fifth layer being provided on a side of the third layer opposite the electrode, the fifth layer having a first depth larger than a second depth of the fourth layer; and a sixth layer of the second conductivity type provided on the electrode, the sixth layer being provided between the first layer and the second layer.
地址 Tokyo JP