Polishing pad with concentric or approximately concentric polygon groove pattern

摘要

Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.

主权项

1. A polishing pad for polishing a substrate, the polishing pad comprising:
a polishing body having a polishing surface and a back surface, the polishing surface having a pattern of grooves comprising concentric or approximately concentric polygons, the pattern of grooves having no radial groove continuous from the inner most polygon to the outer most polygon, wherein all internal angles of each polygon are greater than 90 degrees, wherein each of the polygons has the same number of edges, and wherein the number of edges is determined by the diameter of the polishing pad or by the diameter of the substrate.