发明名称 Producing method of encapsulating layer-covered semiconductor element and producing method of semiconductor device
摘要 A method for producing an encapsulating layer-covered semiconductor element includes a disposing step of disposing a semiconductor element on a support, an encapsulating step of embedding and encapsulating the semiconductor element by an encapsulating layer in an encapsulating sheet including a peeling layer and the encapsulating layer laminated below the peeling layer and made from a thermosetting resin before complete curing, and a heating step of heating and curing the encapsulating layer after the encapsulating step. The heating step includes a first heating step in which the encapsulating sheet is heated at a first temperature, while being mechanically pressurized toward the support and a second heating step in which the encapsulating sheet is heated at a second temperature that is higher than the first temperature after the first heating step.
申请公布号 US9214362(B2) 申请公布日期 2015.12.15
申请号 US201314412746 申请日期 2013.07.17
申请人 NITTO DENKO CORPORATION 发明人 Mitani Munehisa;Ebe Yuki;Ooyabu Yasunari
分类号 H01L21/00;H01L21/56;H01L33/54;H01L23/29;H01L33/56 主分类号 H01L21/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A method for producing an encapsulating layer-covered semiconductor element comprising: a disposing step of disposing a semiconductor element on a support, an encapsulating step of embedding and encapsulating the semiconductor element by an encapsulating layer in an encapsulating sheet including a peeling layer and the encapsulating layer laminated below the peeling layer and made from a thermosetting resin before complete curing, and a heating step of heating and curing the encapsulating layer after the encapsulating step, wherein the heating step includes a first heating step in which the encapsulating sheet is heated at a first temperature, while being mechanically pressurized toward the support and a second heating step in which the encapsulating sheet is heated at a second temperature that is higher than the first temperature after the first heating step.
地址 Osaka JP