| 发明名称 | Asymmetric gas separation membrane and method for separating methanol from mixed organic vapor using the same | ||
| 摘要 | An asymmetric gas separation membrane made of an aromatic polyimide mainly containing repeating units having an ether bond which is heated at a temperature near a softening point (Ts) of the aromatic polyimide, and a method for separating methanol from a methanol-containing mixed organic vapor by allowing methanol to selectively permeate the asymmetric gas separation membrane using the membrane. | ||
| 申请公布号 | US9211497(B2) | 申请公布日期 | 2015.12.15 |
| 申请号 | US201113992600 | 申请日期 | 2011.12.09 |
| 申请人 | UBE INDUSTRIES, LTD. | 发明人 | Takada Ryoichi;Hoshino Harutoshi;Kanougi Tomonori;Yoshinaga Toshimune;Fukunaga Kenji |
| 分类号 | B01D53/22;B01D71/64;B01D53/72;B01D69/02;B01D69/08;C08L79/08 | 主分类号 | B01D53/22 |
| 代理机构 | Knobbe, Martens, Olson & Bear, LLP | 代理人 | Knobbe, Martens, Olson & Bear, LLP |
| 主权项 | 1. An asymmetric gas separation membrane produced by heating an asymmetric gas separation membrane made of a polyimide substantially consisting of repeating units represented by the following general formula (1) at a temperature of Ttr within the range: (Ts−23° C.)<Ttr<(Ts−2° C.) wherein Ttr represents a heating temperature and Ts represents a softening point of the polyimide constituting the asymmetric gas separation membrane; wherein a permeation rate of methanol vapor (P′MeOH) is 4×10−5 cm3 (STP)/cm2·sec·cmHg or more; a ratio of a permeation rate of methanol vapor to a permeation rate of dimethyl carbonate vapor (P′MeOH/P′DMC) is 8 or more; and the polyimide has a softening point of 245° C. or higher, wherein in general formula (1), A represents a tetravalent residue having an aromatic ring, wherein 60 to 100 mol % of the tetravalent residue having an aromatic ring represented by A in general formula (1) is a tetravalent residue based on a biphenyl structure represented by chemical formula (A1)and in general formula (1), B mainly represents a divalent residue represented by the following chemical formula (B1) and/or a divalent residue represented by the following chemical formula (B2): wherein in chemical formula (B2), Ar represents one or more divalent residues selected from the group consisting of the residues represented by chemical formulas (Ar1) to (Ar6) | ||
| 地址 | Ube-Shi JP | ||