| 摘要 |
This exposure method includes the following: making the top surface of a mask (M), said mask (M) having a mask pattern, face the bottom surface of a mask air guide (40); having the mask air guide (40) support the mask (M) in a suspended manner without contact; having a mask-holding device (60) hold the mask (M) that is supported in a suspended manner by the mask air guide (40); using the mask-holding device (60) to move the mask (M) in a scanning direction relative to exposure light; and transferring the mask pattern to an exposure target, namely a substrate, by driving said substrate in the scanning direction relative to the exposure light. |
