| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that is advantageous to correction of the shape of a shot region.SOLUTION: An exposure device successively performs exposure on each of plural shot regions of a base formed on a substrate. A controller for controlling the exposure controls to determine, on the basis of the shape information of each of the plural shot regions, for each shot regions which one of collective exposure for exposing a shot region with light in a lump without parting the shot region and divisional exposure of parting the shot region into the plural partial regions and exposing each partial region with light should be executed, determine the shape of each partial region of the shot region on which the divisional exposure is executed, and perform the collective exposure or the divisional exposure on each of the plural shot regions on the basis of the determination result and the determined shape of each partial region. |
