ACTIVE LAYER OF THIN FILM TRANSISTOR CRYSTALLIZING APPARATUS AND THE CRYSTALLIZING METHOD USING THE SAME
摘要
According to an embodiment of the present invention, disclosed is an active layer of a thin film transistor crystallizing apparatus which includes: a first laser for irradiating a first beam to crystallize an active layer, and a second laser for irradiating a second beam to heat the active layer, and has an asymmetric shape of a profile of the second beam.
申请公布号
KR20150138530(A)
申请公布日期
2015.12.10
申请号
KR20140065337
申请日期
2014.05.29
申请人
SAMSUNG DISPLAY CO., LTD.
发明人
CHOO, BYOUNG KWON;AHN, SANG HOON;CHEONG, BYOUNG HO;CHO, JOO WOAN;CHO, HYUN JIN;HAN, SOO YEON