发明名称 ACTIVE LAYER OF THIN FILM TRANSISTOR CRYSTALLIZING APPARATUS AND THE CRYSTALLIZING METHOD USING THE SAME
摘要 According to an embodiment of the present invention, disclosed is an active layer of a thin film transistor crystallizing apparatus which includes: a first laser for irradiating a first beam to crystallize an active layer, and a second laser for irradiating a second beam to heat the active layer, and has an asymmetric shape of a profile of the second beam.
申请公布号 KR20150138530(A) 申请公布日期 2015.12.10
申请号 KR20140065337 申请日期 2014.05.29
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 CHOO, BYOUNG KWON;AHN, SANG HOON;CHEONG, BYOUNG HO;CHO, JOO WOAN;CHO, HYUN JIN;HAN, SOO YEON
分类号 H01L51/56;H01L27/32 主分类号 H01L51/56
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