MULTIPLE PATTERN MASK OF ION IMPLANTATION AND METHOD OF ION IMPLANTATION USING THE SAME
摘要
The present invention relates to a multi-pattern mask for ion implantation, prepared on a substrate and controlling ion penetration into the substrate. The multi-pattern mask includes: a base part preventing the ion; and a pattern part exposing at least a part of the substrate so as to allow the ion to penetrate the substrate. Two or more pattern parts are prepared in different sizes or shapes.
申请公布号
KR20150138687(A)
申请公布日期
2015.12.10
申请号
KR20140066960
申请日期
2014.06.02
申请人
INTELLECTUAL KEYSTONE TECHNOLOGY LLC
发明人
PARK, SANG JIN;SEO, KYOUNG JIN;PARK, YOUNG SANG;HONG, JUN KI;LIM, HEUNG KYOON;LEE, DOO YOUL;PARK, SUNG CHAN