发明名称 CARRIER DEVICE AND PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a carrier device which suppresses damage and dust emission of a sheet substrate and adjusts accurately and smoothly the position of the sheet substrate in the width direction and a pattern formation method.SOLUTION: A carrier device 12 carries a long flexible substrate P in the longitudinal direction and includes a pair of guide rollers GR1 and GR2 which are arranged separately on the carrying path for the substrate P and folds the carrier path for the substrate P in a state where a specified tensile force is applied in the longitudinal direction and a tensile force distribution adjustment part 60 which adjusts the distribution of the tensile force T to be applied to the substrate P in the width direction intersecting the longitudinal direction, in a state of not contacting with the substrate P or a low-friction state.
申请公布号 JP2015222375(A) 申请公布日期 2015.12.10
申请号 JP20140107353 申请日期 2014.05.23
申请人 NIKON CORP 发明人 YOKOTA MUNEYASU
分类号 G03F9/00;B65H23/032;B65H23/038;G03F7/24 主分类号 G03F9/00
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