| 发明名称 |
HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY |
| 摘要 |
A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains. |
| 申请公布号 |
US2015356989(A1) |
申请公布日期 |
2015.12.10 |
| 申请号 |
US201514830534 |
申请日期 |
2015.08.19 |
| 申请人 |
Seagate Technology LLC |
发明人 |
Xu Yuan;Lee Kim Y.;Kuo David S.;Wago Koichi;Hu Wei |
| 分类号 |
G11B5/84 |
主分类号 |
G11B5/84 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the resulting imprinted resist; depositing a block copolymer (“BCP”) material on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface pattern on the resulting imprinted resist; annealing the deposited BCP; and removing at least a portion of the annealed BCP to form a template having discrete domains is formed. |
| 地址 |
Cupertino CA US |
