| 摘要 |
An etching composition for non-conductive substrates such as polyester, polyether, polyimide, polyurethane, epoxy resin, polysulfone, polyethersulfone, polyetherimide, and polyamide, comprising a halogenide and/or nitrate of a metal selected from the group consisting of Na, Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ca, Zn, and combinations thereof such as FeCl<SUB>3</SUB>, FeCl<SUB>2</SUB>, TiCl<SUB>3</SUB>, CaCl<SUB>2</SUB>, CuCl<SUB>2</SUB>, CrCl<SUB>3</SUB>, ZnCl<SUB>2</SUB>, MgCl<SUB>2</SUB>, MnCl<SUB>2</SUB>, and Cr(NO<SUB>3</SUB>)<SUB>3</SUB>; and a related method for etching.
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