发明名称 イオンビームの中心線軌跡を中心に静電レンズを制御する方法および装置
摘要 <p>A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.</p>
申请公布号 JP5831770(B2) 申请公布日期 2015.12.09
申请号 JP20130547512 申请日期 2011.12.12
申请人 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド 发明人 ラドバノフ、スベトラナ;ケラーマン、ピーター、エル.;シンクレア、フランク;リンドバーグ、ロバート、シー.
分类号 H01J37/12;H01J37/147;H01J37/317;H01L21/265 主分类号 H01J37/12
代理机构 代理人
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