method for treating substrate,申请号KR20130144792-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	method for treating substrate
摘要	<p>본 발명은 기판 처리 방법을 개시한다. 그의 방법은, 기판 상의 절연 층을 습식 용액에 노출하여 상기 절연 층의 상부 면에 상기 친수성 부산물들을 형성하는 단계와, 상기 절연 층의 상부 면에서 친수성 부산물들을 제거하는 단계와, 상기 절연 층을 식각하는 단계를 포함한다.</p>
申请公布号	KR101575131(B1)	申请公布日期	2015.12.08
申请号	KR20130144792	申请日期	2013.11.26
申请人	피에스케이 주식회사	发明人	신평수
分类号	H01L21/306;H01L21/3065	主分类号	H01L21/306
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Apparatus and method for controlling congestion in a communication network

Mobile router information management server, mobile router, mobile router network, and communication method for same

Long term metrics applied to multivariate testing

System and method for monitoring and managing data center resources in real time

Server system, management device, server management method, and program

Configuration of third party applications in a sandboxed environment

Security infrastructure for cloud services

Method and apparatus for managing diameter routing

Edge windowing of OFDM based systems

Message server that retains messages deleted by one client application for access by another client application

Handling traffic flows in a mobile communications network

Operating method of human interface device

Method and apparatus for performing cross-carrier scheduling for SPS

Managing sounding signals to limit power in a multicarrier wireless device

Apparatus and method of compensating for clock frequency and phase variations by processing packet delay values

Method and apparatus for managing carrier measurements

Full-duplex optical transceiver applicable to digital coherent system

Dynamic cell bonding (DCB) for radio-over-fiber (RoF)-based networks and communication systems and related methods

Light powered communication systems and methods of using the same

Adding new alternative paths for restoration in WSON network