发明名称 METHOD FOR FORMING CHALCOGENIDE LAYERS
摘要 PROBLEM TO BE SOLVED: To provide a method for forming on a substrate a chalcogenide layer containing at least two metallic elements and Se.SOLUTION: The method comprises: depositing on the substrate a metallic layer containing the at least two metallic elements 101; and annealing the metallic layer in an atmosphere comprising both a S-containing vapor such as HS vapor and a Se-containing vapor such as HSe vapor, thereby forming the chalcogenide layer 102. The annealing is done, e.g., at a temperature in the range from 450°C to 550°C, resulting in a layer with good morphological quality and large grain size, the layer being free of S. The method is used, e.g., for forming an absorber layer of a photovoltaic cell.
申请公布号 JP2015220457(A) 申请公布日期 2015.12.07
申请号 JP20150090767 申请日期 2015.04.27
申请人 IMEC VZW;KING ABDULAZIZ CITY FOR SCIENCE & TECHNOLOGY;UNIV HASSELT 发明人 SOUHAIB OUESLATI
分类号 H01L31/0749;H01L31/072;H01L31/18 主分类号 H01L31/0749
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