发明名称 SUPPORT PLATE, METHOD OF FORMING SUPPORT PLATE AND WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a support plate that enables a wafer from being easily peeled off and also can make neither starch nor adhesive agent be left on the surface of a device.SOLUTION: The surface of a wafer having a device area having plural devices formed thereon and an outer peripheral extra area surrounding the device area is adhesively attached to a support plate. The support plate has a base plate having a recess portion formed on a surface area of the support plate which corresponds to the device area of the attached wafer, and an annular groove formed in an area corresponding to the outer peripheral extra area of the wafer, and a flexible member filled in the recess portion of the base plate. By injecting adhesive agent into the annular groove, the wafer is adhesively attached to the surface of the support plate through the adhesive agent.
申请公布号 JP2015220302(A) 申请公布日期 2015.12.07
申请号 JP20140101964 申请日期 2014.05.16
申请人 DISCO ABRASIVE SYST LTD 发明人 KARL PRIEWASSER
分类号 H01L21/304;B24B7/04;H01L21/683 主分类号 H01L21/304
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