| 发明名称 |
COMPOSITIONS FOR CLEANING III-V SEMICONDUCTOR MATERIALS AND METHODS OF USING SAME |
| 摘要 |
Liquid compositions useful for the cleaning of residue and contaminants from a III-V microelectronic device material, such as InGaAs, without substantially removing the III-V material. The liquid compositions are improvements of the SC1 and SC2 formulations. |
| 申请公布号 |
US2015344825(A1) |
申请公布日期 |
2015.12.03 |
| 申请号 |
US201314648815 |
申请日期 |
2013.12.04 |
| 申请人 |
ENTEGRIS, INC. ;ATMI TAIWAN CO., LTD |
发明人 |
COOPER Emanuel I.;WU Hsing-Chen;YANG Min-Chieh;TU Sheng-Hung;CHEN Li-Min |
| 分类号 |
C11D7/04;C11D7/26;C11D7/32;C11D7/08 |
主分类号 |
C11D7/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A liquid composition for cleaning the surface of a III-V microelectronic device material, said composition comprising at least one acid, at least one oxidizing agent, and water, with the proviso that (a) the at least one oxidizing agent comprises an oxidant that is milder than hydrogen peroxide, (b) the liquid composition further comprises at least one corrosion inhibitor, or (c) both (a) and (b). |
| 地址 |
Billerica MA US |
