发明名称 METHOD AND APPARATUS FOR FORMING ON A SUBSTRATE A PATTERN OF A MATERIAL
摘要 A method for forming on a substrate (108; 214) a pattern of a material, the method comprising: providing (S100) a material layer (104); providing (S104, S106) an adhesive layer (106), wherein at least one of the material layer (104) or the adhesive layer (106) comprises a pattern corresponding to the pattern to be formed on the substrate (108; 214); and transferring (S108) the material to the substrate (108; 214) with the adhesive fixing the material to a surface (110; 216) of the substrate (108; 214). This solves the problem of forming on a substrate a pattern of a material that, in general, cannot be applied to the substrate directly due to the fact that the material cannot be printed and/or has no or reduced adherence properties with respect to the substrate.
申请公布号 US2015351250(A1) 申请公布日期 2015.12.03
申请号 US201214436829 申请日期 2012.10.31
申请人 KELLA Dror;NEGREANU Eyal;AMIR Gideon;SANDLER Mark;GRINWALD Yaron 发明人 KELLA Dror;NEGREANU Eyal;AMIR Gideon;SANDLER Mark;GRINWALD Yaron
分类号 H05K3/20;H05K3/12 主分类号 H05K3/20
代理机构 代理人
主权项
地址 Nes-Ziona IL