发明名称 FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM
摘要 To provide a field-effect transistor, containing: a substrate; a protective layer; a gate insulating layer formed between the substrate and the protective layer; a source electrode and a drain electrode, which are formed to be in contact with the gate insulating layer; a semiconductor layer, which is formed at least between the source electrode and the drain electrode, and is in contact with the gate insulating layer, the source electrode, and the drain electrode; and a gate electrode, which is formed at an opposite side to the side where the semiconductor layer is provided, with the gate insulating layer being between the gate electrode and the semiconductor layer, and is in contact with the gate insulating layer, wherein the protective layer contains a metal oxide composite, which contains at least Si and alkaline earth metal.
申请公布号 US2015349138(A1) 申请公布日期 2015.12.03
申请号 US201314440969 申请日期 2013.11.27
申请人 SONE Yuji;UEDA Naoyuki;NAKAMURA Yuki;TAKADA Mikiko;MATSUMOTO Shinji;SAOTOME Ryoichi;ARAE Sadanori;ABE Yukiko;RICO COMPANY, LTD 发明人 SONE Yuji;UEDA Naoyuki;NAKAMURA Yuki;TAKADA Mikiko;MATSUMOTO Shinji;SAOTOME Ryoichi;ARAE Sadanori;ABE Yukiko
分类号 H01L29/786;G09G3/38;G09G3/30;G09G3/36;H01L27/12;G09G3/34 主分类号 H01L29/786
代理机构 代理人
主权项 1. A field-effect transistor, comprising: a substrate; a protective layer; a gate insulating layer formed between the substrate and the protective layer; a source electrode and a drain electrode, which are formed to be in contact with the gate insulating layer; a semiconductor layer, which is formed at least between the source electrode and the drain electrode, and is in contact with the gate insulating layer, the source electrode, and the drain electrode; and a gate electrode, which is formed at an opposite side to the side where the semiconductor layer is provided, with the gate insulating layer being between the gate electrode and the semiconductor layer, and is in contact with the gate insulating layer, wherein the protective layer contains a metal oxide composite, which contains at least Si and alkaline earth metal.
地址 Ohta-ku, Tokyo JP