发明名称 |
MICRO ELECTRO MECHANICAL SYSTEM, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF |
摘要 |
The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved. |
申请公布号 |
US2015343857(A1) |
申请公布日期 |
2015.12.03 |
申请号 |
US201514730362 |
申请日期 |
2015.06.04 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
Yamaguchi Mayumi;Izumi Konami;Tateishi Fuminori |
分类号 |
B60C23/04;B60C23/20 |
主分类号 |
B60C23/04 |
代理机构 |
|
代理人 |
|
主权项 |
1. (canceled) |
地址 |
Atsugi-shi JP |