LITHOGRAPHY SYSTEM, SIMULATION DEVICE, AND PATTERN FORMING METHOD

摘要

A lithography system is provided with: a first calculation unit for finding a first group of parameter values related to forming a pattern for a wafer; a second calculation unit for finding a second group of parameter values at least part of which are common with the first group of parameter values related to forming that pattern; and an integrated computation unit for evaluating the state of the pattern formed on the wafer and forming conditions when forming the pattern on the basis of the first group and second group of parameter values and determining whether or not to recalculate the group of parameter values corresponding to at least one of the first and second calculation units according to these evaluation results. Thus, parameters used in a lithography process can be set efficiently.