发明名称 WAFER HOLDER AND DEPOSITION APPARATUS
摘要 According to an embodiment, a wafer holder includes a heat receiving portion, a heating portion, and a contact making portion. The heat receiving portion receives heat from a heat source. The heating portion heats a wafer using the heat received by the heat receiving portion. The contact making portion makes contact with an outer edge of the wafer. A heat-transfer suppressing portion is provided at least either for the contact making portion, or in between the heat receiving portion and the contact making portion, or in between the heating portion and the contact making portion.
申请公布号 KR20150135107(A) 申请公布日期 2015.12.02
申请号 KR20150069615 申请日期 2015.05.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUDA TAKUYA;TERADA TAKAHIRO;SHIMMURA TADASHI;MATSUBA HIROSHI;KOBAYASHI HIROAKI;MORIYA NORIYUKI
分类号 H01L21/683;H01L21/02;H01L21/324;H01L21/687 主分类号 H01L21/683
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