| 摘要 |
The present invention provides a facility for purifying a harmful gas, which treats a harmful gas discharged from one or a plurality of process chambers where a process is performed in a vacuum state by a vacuum pump. The treatment facility of the present invention includes: a microwave generation unit for generating microwaves; a microwave splitting unit which supply the microwave introduced from the microwave generation unit to a plurality of waveguides, separately; microwave delivery units which are confines to respective waveguides, and supplies the microwave supplied from the microwave splitting unit; and a plurality of plasma discharge units which are installed in one or a plurality of pipes where the harmful gas discharged from the one or plurality of process chambers flows, and are supplied with the microwave from each corresponding microwave delivery unit, and dissolves a harmful material in the harmful gas by generating plasma discharge therein. |
