| 摘要 |
A Wynne-Dyson projection lens for use in an ultraviolet optical lithography system is disclosed, wherein the Wynne-Dyson projection lens is configured to have reduced susceptibility to damage from ultraviolet radiation. The Wynne-Dyson projection lens utilizes lens elements that are made of optical glasses that are resistant to damage from ultraviolet radiation, but that also provide sufficient degrees of freedom to correct aberrations. The glass types used for the lens elements are selected from a group of optical glasses consisting of: fused silica, S-FPL51Y, S-FSL5Y, BSM51Y and BAL15Y. |
