发明名称 NON-PHOTOSENSITIVE RESIN COMPOSITION
摘要 A non-photosensitive resin composition including: a self-cross-linkable copolymer having structural units of Formulae (1) and (2):;;wherein each R0 is independently a hydrogen atom or methyl group; X is an —O— group or an —NH— group; R1 is a single bond or a C1-6 alkylene group; R2 is a C1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1≦a+b≦5, and b is 2, 3, or 4, such R2 optionally differ from each other; R3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and R4 is an organic group having an epoxy group:;;wherein c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6; and a solvent.
申请公布号 US2015338556(A1) 申请公布日期 2015.11.26
申请号 US201314435918 申请日期 2013.10.04
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 SAKAGUCHI Takahiro;ADACHI Isao
分类号 G02B3/00;G02B1/12;C08J5/18 主分类号 G02B3/00
代理机构 代理人
主权项 1. A non-photosensitive resin composition comprising: a self-cross-linkable copolymer having structural units of Formulae (1) and (2):(in Formulae (1) and (2), each R0 is independently a hydrogen atom or a methyl group; X is an —O— group or an —NH— group; R1 is a single bond or a C1-6 alkylene group; R2 is a C1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1≦a+b≦5, and b is 2, 3, or 4, such R2 optionally differ from each other; R3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and when R3 is a divalent organic group of Formula (I), a carbonyl group in Formula (I) is bonded to a main chain of a structural unit of Formula (2); and R4 is an organic group having an epoxy group):(in Formulae (I), (II), and (III), c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6); and a solvent.
地址 Tokyo JP