发明名称 |
NON-PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
A non-photosensitive resin composition including: a self-cross-linkable copolymer having structural units of Formulae (1) and (2):;;wherein each R0 is independently a hydrogen atom or methyl group; X is an —O— group or an —NH— group; R1 is a single bond or a C1-6 alkylene group; R2 is a C1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1≦a+b≦5, and b is 2, 3, or 4, such R2 optionally differ from each other; R3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and R4 is an organic group having an epoxy group:;;wherein c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6; and a solvent. |
申请公布号 |
US2015338556(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
US201314435918 |
申请日期 |
2013.10.04 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
SAKAGUCHI Takahiro;ADACHI Isao |
分类号 |
G02B3/00;G02B1/12;C08J5/18 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
1. A non-photosensitive resin composition comprising:
a self-cross-linkable copolymer having structural units of Formulae (1) and (2):(in Formulae (1) and (2), each R0 is independently a hydrogen atom or a methyl group; X is an —O— group or an —NH— group; R1 is a single bond or a C1-6 alkylene group; R2 is a C1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1≦a+b≦5, and b is 2, 3, or 4, such R2 optionally differ from each other; R3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and when R3 is a divalent organic group of Formula (I), a carbonyl group in Formula (I) is bonded to a main chain of a structural unit of Formula (2); and R4 is an organic group having an epoxy group):(in Formulae (I), (II), and (III), c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6); and
a solvent. |
地址 |
Tokyo JP |