APPARATUS AND METHOD FOR INSPECTING DEFECT OF SUBSTRATE

摘要

The present invention relates to an apparatus and a method for inspecting a defect in a substrate. The apparatus and method for inspecting a defect in a substrate according to the present invention accurately and quickly control the illumination of a light source for detecting the defect in the substrate through a line scan sensor by detecting the brightness of light passing through the substrate from the light source through a luminous flux sensor; determining whether the measured brightness is in a defect detection range through the line scan sensor; firstly controlling the illumination of the light source based on a light setting value with regard to resistivity stored in a memory unit if the measured brightness is not in the defect detection range; photographing an image of the substrate by using the line scan sensor; and calculating an average gray level value of the photographed image, and then secondarily controlling the illumination of the light source based on the calculated gray level value.