SUBSTRATE-PROCESSING DEVICE

摘要

Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber in which a process with respect to a substrate is performed, a preliminary chamber connected to the process chamber, the preliminary chamber having a passage through which the substrate is accessed, a blocking plate partitioning the inside of the preliminary chamber into a holding region and a transfer region, a substrate holder on which at least one substrate is loaded, the substrate holder being switchable into a loading position in which the substrate holder is disposed on the holding region and a process position in which the substrate holder is disposed on the process chamber, a substrate transfer unit transferring the substrate holder from the loading position to the process position, the substrate transfer unit including a transfer arm connected to the substrate holder and a driver operating the transfer arm, a gas supply port supplying an inert gas into the preliminary chamber, and a lower exhaust port connected to the transfer region and disposed above the gas supply port to exhaust the inside of the preliminary chamber. The lower exhaust port is disposed closer to a bottom surface of the preliminary chamber than a top surface of the preliminary chamber.

主权项

1. A substrate processing apparatus comprising:
a process chamber in which a process with respect to a substrate is performed; a preliminary chamber connected to the process chamber, the preliminary chamber having a passage through which the substrate is accessed; a blocking plate partitioning the inside of the preliminary chamber into a holding region and a transfer region; a substrate holder on which at least one substrate is loaded, the substrate holder being switchable into a loading position in which the substrate holder is disposed on the holding region and a process position in which the substrate holder is disposed on the process chamber; a substrate transfer unit transferring the substrate holder from the loading position to the process position, the substrate transfer unit comprising a transfer arm connected to the substrate holder and a driver operating the transfer arm; a gas supply port supplying an inert gas into the preliminary chamber; and a lower exhaust port connected to the transfer region and disposed above the gas supply port to exhaust the inside of the preliminary chamber, wherein the lower exhaust port is disposed closer to a bottom surface of the preliminary chamber than a top surface of the preliminary chamber.