| 摘要 |
An ultraviolet light substrate cleaning method capable of adjusting ultraviolet light irradiation energy comprises the following steps: step1, providing an ultraviolet lamp (10) and a substrate (20) to be cleaned by ultraviolet light; step2, arranging a plurality of light shading plates (30) between the ultraviolet lamp (10) and the substrate (20) to be cleaned by ultraviolet light; step3, rotating the light shading plates (30) and adjusting the area irradiated by ultraviolet light emitted from the ultraviolet lamp (10) onto the substrate (20), so that energy irradiated by ultraviolet light onto the substrate (20) per unit time is controlled; step4, the ultraviolet lamp (10) emitting ultraviolet light to clean the substrate (20). Through the method, ultraviolet light energy for cleaning the substrate can be adjusted flexibly, so that organics attached to the substrate surface can be removed effectively and circuitous patterns on the substrate can be prevented from being damaged by static. |
