发明名称 Electric and electronic part copper alloy sheet with excellent bending workability and stress relaxation resistance
摘要 An electric and electronic part copper alloy sheet with excellent bending workability and stress relaxation resistance is made from a copper alloy containing 1.5 to 4.0 percent by mass of Ni, Si satisfying a Ni/Si mass ratio of 4.0 to 5.0, 0.01 to 1.3 percent by mass of Sn, and the remainder composed of copper and incidental impurities, wherein the average crystal grain size is 5 to 20 μm, the standard deviation of the crystal grain size satisfies 2σ<10 μm, and the proportion of the number of particles having a particle diameter of 90 to 300 nm in Ni—Si dispersed particles having a particle diameter of 30 to 300 nm is 20% or more, where the particles are observed in a cross-section defined by a direction perpendicular to a sheet surface and a direction parallel to a rolling direction.
申请公布号 US9194026(B2) 申请公布日期 2015.11.24
申请号 US201313798657 申请日期 2013.03.13
申请人 (Kobe Steel, Ltd.) 发明人 Katsura Shinya
分类号 C22C9/06;C22F1/08 主分类号 C22C9/06
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A copper alloy sheet, comprising: Cu; 1.5 to 4.0 percent by mass of Ni; Si satisfying a Ni/Si mass ratio of 4.0 to 5.0; and 0.01 to 1.3 percent by mass of Sn, wherein the copper alloy sheet has an average crystal grain size of more than 10 μm and 20 μm or less, a standard deviation of the crystal grain size satisfies 2σ<10 μm, among Ni—Si dispersed particles having a particle diameter of 30 to 300 nm, a proportion of Ni—Si dispersed particles having a particle diameter of 90 to 300 nm is 20% or more when the particles are observed in a cross-section defined by a direction perpendicular to a sheet surface and a direction parallel to a rolling direction, and the copper alloy sheet is obtained by a process comprising: precipitating Ni—Si dispersed particles in at least one precipitation treatment after a hot rolling treatment and before a recrystallization treatment accompanied by a solution treatment.
地址 Kobe-shi JP