发明名称 |
Donor substrate for laser induced thermal imaging, method of laser induced thermal imaging and method of manufacturing an organic light emitting display device using the same |
摘要 |
A donor substrate, a method of laser induced thermal imaging, and a method of manufacturing an organic light emitting display device are disclosed. In the method of laser induced thermal imaging, a donor substrate is provided to include a base substrate, a light to heat conversion layer, a transfer layer and a functional layer. The functional layer includes a material radiating an infrared light. The donor substrate is laminated to an acceptor substrate. A laser beam is radiated into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer. A position of the organic layer pattern is observed using an infrared microscope. A laser beam position is adjusted and the donor substrate is separated from the acceptor substrate. |
申请公布号 |
US9193205(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201314046103 |
申请日期 |
2013.10.04 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Yeon Jung-Hoon |
分类号 |
H01L51/00;B41M5/46 |
主分类号 |
H01L51/00 |
代理机构 |
Knobbe Martens Olson & Bear LLP |
代理人 |
Knobbe Martens Olson & Bear LLP |
主权项 |
1. A method of laser induced thermal imaging, comprising
providing a donor substrate including a base substrate, a light to heat conversion layer, a transfer layer and a functional layer, the functional layer including a material radiating an infrared light; laminating the donor substrate to an acceptor substrate; radiating a laser beam into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer; observing a position of the organic layer pattern using an infrared microscope; adjusting a laser beam position; and separating the donor substrate from the acceptor substrate. |
地址 |
Yongin, Gyeonggi-Do KR |