发明名称 Donor substrate for laser induced thermal imaging, method of laser induced thermal imaging and method of manufacturing an organic light emitting display device using the same
摘要 A donor substrate, a method of laser induced thermal imaging, and a method of manufacturing an organic light emitting display device are disclosed. In the method of laser induced thermal imaging, a donor substrate is provided to include a base substrate, a light to heat conversion layer, a transfer layer and a functional layer. The functional layer includes a material radiating an infrared light. The donor substrate is laminated to an acceptor substrate. A laser beam is radiated into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer. A position of the organic layer pattern is observed using an infrared microscope. A laser beam position is adjusted and the donor substrate is separated from the acceptor substrate.
申请公布号 US9193205(B2) 申请公布日期 2015.11.24
申请号 US201314046103 申请日期 2013.10.04
申请人 Samsung Display Co., Ltd. 发明人 Yeon Jung-Hoon
分类号 H01L51/00;B41M5/46 主分类号 H01L51/00
代理机构 Knobbe Martens Olson & Bear LLP 代理人 Knobbe Martens Olson & Bear LLP
主权项 1. A method of laser induced thermal imaging, comprising providing a donor substrate including a base substrate, a light to heat conversion layer, a transfer layer and a functional layer, the functional layer including a material radiating an infrared light; laminating the donor substrate to an acceptor substrate; radiating a laser beam into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer; observing a position of the organic layer pattern using an infrared microscope; adjusting a laser beam position; and separating the donor substrate from the acceptor substrate.
地址 Yongin, Gyeonggi-Do KR