| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photoelectric conversion element, causing no screen defect even during an operation with an application of a high electric field, thereby achieving a stable avalanche multiplication operation in a high-sensitivity imaging device using a photoelectric conversion element including a HARP film formed on a surface of an FOP substrate after polishing, and to provide a photoelectric conversion element manufactured by the method.SOLUTION: A method for manufacturing a photoelectric conversion element includes the steps of: subjecting a surface of an FOP substrate to mechanical polishing; subjecting the surface of the FOP substrate, which has been subjected to the mechanical polishing, to planarization processing by means of an ion etching method; and forming a HARP film on the surface which has been subjected to the planarization processing by means of an ion etching method. |
