Microlithographic imaging optical system including multiple mirrors

摘要

An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.

主权项

1. An imaging optical system having an object plane and an image plane, the imaging optical system comprising:
a plurality of mirrors configured to image an object field in the object plane into an image field in the image plane, wherein:
the plurality of mirrors comprises a first mirror which, of the plurality of mirrors, is most closely adjacent to the object field or the image field;the first mirror comprises a support body comprising a first material;the plurality of mirrors comprises a second mirror;the second mirror comprises a support body comprising a second material;a modulus of elasticity of the first material is at least twice as great as a modulus of elasticity of the second material; andthe imaging optical system is a microlithographic imaging optical system.