发明名称 |
Reversed stack MTJ |
摘要 |
An integrated circuit device includes a substrate and a magnetic tunneling junction (MTJ). The MTJ includes at least a pinned layer, a barrier layer, and a free layer. The MTJ is formed over a surface of the substrate. Of the pinned layer, the barrier layer, and the free layer, the free layer is formed first and is closest to the surface. This enables a spacer to be formed over a perimeter region of the free layer prior to etching the free layer. Any damage to the free layer that results from etching or other free layer edge-defining process is kept at a distance from the tunneling junction by the spacer. |
申请公布号 |
US9196825(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201314016343 |
申请日期 |
2013.09.03 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
Huang Wei-Hang;Sung Fu-Ting;Hsu Chern-Yow;Liu Shih-Chang;Tsai Chia-Shiung |
分类号 |
H01L29/66;H01L43/12;H01L43/02;H01L43/08 |
主分类号 |
H01L29/66 |
代理机构 |
Eschweiler & Associates, LLC |
代理人 |
Eschweiler & Associates, LLC |
主权项 |
1. An integrated circuit device, comprising:
a substrate; a magnetic tunneling junction (MTJ) formed over a surface of the substrate, the MTJ comprising;
a free layer configured to switch between at least two different magnetic orientations, arranged over the surface of the substrate;an insulating barrier layer arranged over the free layer; anda pinned layer having a fixed magnetic orientation, arranged over the insulating barrier layer, wherein the free layer is connected to a bottom electrode and the pinned layer is connected to a top electrode, and wherein the top electrode, the pinned layer and the insulating barrier layer constitute a stack having substantially aligned vertical sidewalls. |
地址 |
Hsin-Chu TW |