发明名称 METHOD FOR MANUFACTURING DOPED METAL CHALCOGENIDE FILM AND THE FILM MANUFACTURED BY THE SAME
摘要 The present invention relates to manufacturing a heterogeneous element film, especially, to a method for manufacturing a doped metal chalcogenide film and a film thereof. The present invention relates to the method for manufacturing a doped metal chalcogenide film which comprises the following steps of: supplying a vaporized first metal precursor; supplying a vaporized second metal precursor; supplying gas having chalcogen; and forming a film by reacting the first metal precursor, the second metal precursor, and the gas having chalcogen on a growth substrate under a first temperature condition. The method provides a doped metal chalcogenide film having high crystalization.
申请公布号 KR20150129485(A) 申请公布日期 2015.11.20
申请号 KR20140056509 申请日期 2014.05.12
申请人 LG ELECTRONICS INC. 发明人 CHOI, MIN SEOK;KIM, TAE HYEONG;MOON, JIN SAN;JUNG, MYNG HEE
分类号 H01L21/28;C23C16/06;C23C16/44;H01L21/20 主分类号 H01L21/28
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