发明名称 |
METHOD FOR MANUFACTURING DOPED METAL CHALCOGENIDE FILM AND THE FILM MANUFACTURED BY THE SAME |
摘要 |
The present invention relates to manufacturing a heterogeneous element film, especially, to a method for manufacturing a doped metal chalcogenide film and a film thereof. The present invention relates to the method for manufacturing a doped metal chalcogenide film which comprises the following steps of: supplying a vaporized first metal precursor; supplying a vaporized second metal precursor; supplying gas having chalcogen; and forming a film by reacting the first metal precursor, the second metal precursor, and the gas having chalcogen on a growth substrate under a first temperature condition. The method provides a doped metal chalcogenide film having high crystalization. |
申请公布号 |
KR20150129485(A) |
申请公布日期 |
2015.11.20 |
申请号 |
KR20140056509 |
申请日期 |
2014.05.12 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
CHOI, MIN SEOK;KIM, TAE HYEONG;MOON, JIN SAN;JUNG, MYNG HEE |
分类号 |
H01L21/28;C23C16/06;C23C16/44;H01L21/20 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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