| 发明名称 |
POLYETHYLENE-BASED STRUCTURE |
| 摘要 |
A polyethylene-based structure of the present invention is a polyethylene-based structure composed of a resin composition containing 60 to 90% by mass of a polyethylene (A), 5 to 35% by mass of an acid-modified polyethylene (B), and 5 to 35% by mass of a m-xylylene group-containing polyamide (C), wherein the m-xylylene group-containing polyamide (C) is dispersed in the form of layers in the resin composition which constitutes the structure, and the acid value of the acid-modified polyethylene (B) is from 5 to 30 mg/g. |
| 申请公布号 |
US2015329712(A1) |
申请公布日期 |
2015.11.19 |
| 申请号 |
US201214655372 |
申请日期 |
2012.12.28 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY INC. |
发明人 |
Ishii Kentaro;Katou Tomonori;Kouno Kenji;Kobayashi Hiroshi |
| 分类号 |
C08L23/06;B65D1/40 |
主分类号 |
C08L23/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polyethylene-based structure, comprising a resin composition containing:
60 to 90% by mass of a polyethylene (A); 5 to 35% by mass of an acid-modified polyethylene (B); and 5 to 35% by mass of a m-xylylene group-containing polyamide (C), wherein the m-xylylene group-containing polyamide (C) is dispersed in a form of layers in the structure, and an acid value of the acid-modified polyethylene (B) is from 5 to 30 mg/g. |
| 地址 |
Tokyo JP |
