发明名称 WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wafer processing method that can suppress an alignment time from lengthening and prevent erroneous processing of a semiconductor chip.SOLUTION: An adhesive film (25) is mounted on the back surface of a semiconductor wafer (1) which has been separated into individual semiconductor chips (6), and the back surface of the adhesive film is supported by a support tape (26). Thereafter, the support tape side is mounted on a chuck table (30) of a laser processing device, and the semiconductor wafer is sucked and held through the support tape and the adhesive film by the chuck table. Under this sucked and held state, a protection tape (15) adhering to the surface (1a) side of the semiconductor wafer is exfoliated, and the adhesive film exposed to the gaps between the semiconductor chips is irradiated with a laser beam while the semiconductor wafer is sucked and held even after the exfoliation, and the adhesive film is broken along parting grooves (4).
申请公布号 JP2015207724(A) 申请公布日期 2015.11.19
申请号 JP20140088833 申请日期 2014.04.23
申请人 DISCO ABRASIVE SYST LTD 发明人 SATO ATSUSHI
分类号 H01L21/301;B23K26/352;H01L21/304 主分类号 H01L21/301
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